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Stensborg’s Press and Technical Center

Latest News

Stensborg’s Press and Technical Center

Stensborg News

Stensborg Blogs

5 Emerging Nanotechnology Trends Shaping 2025–2030 (And How Scalable Nanoimprint Lithography Enables Them)

December 2nd, 2025|

From nanophotonics to metamaterials and advanced microfluidics, this article highlights the leading trends shaping the future of nanotechnology and how Stensborg’s scalable Rolling Nanoimprint Lithography solutions enable engineers to move from prototype to industrial production.

Rolling Nanoimprint Lithography for AR Waveguides, Diffractive Optical Elements, and Scalable Nano Manufacturing

October 9th, 2025|

Whether you’re developing next-generation biochips, structuring optics on black polyimide, or producing flexible photonic films, Stensborg delivers scalable replication where mask lithography cannot. Read how in this technical breakdown.

Stensborg’s Flexible Alternative to PhotoLithography for both Transparent and Non-transparent Materials: From Lab-Scale Soft Lithography to Industrial Roll-to-Roll Nanoimprint

July 2nd, 2025|

Whether you’re developing next-generation biochips, structuring optics on black polyimide, or producing flexible photonic films, Stensborg delivers scalable replication where mask lithography cannot. Read how in this technical breakdown.

How to Select the Right Resin for Your UV Nanoimprint Lithography Process: A Consumables Technical Guide by Stensborg

May 6th, 2025|

Learn from our UV chemistry specialists which template and replication resins are best suited to ensure optimal success in your Nanoimprint Lithography (NIL) development.

OUR TECHNOLOGY

Accelerating the Industrialisation of Nanostructured Surfaces with HoloPrint® technology

Many nano-enabled products fail to scale because laboratory processes cannot be reproduced under industrial conditions. Stensborg addresses this gap with IP-backed Rolling Nanoimprint Lithography (RNIL), combining mechanical precision with localized UV curing at the nip point to enable continuous, high-fidelity replication.

The patented HoloPrint® optical nip architecture delivers focused UV curing directly at the imprint interface, enabling accurate replication of sub-100 nm structures across rigid and flexible substrates. The result is a scalable manufacturing process with improved yield, reduced material waste, and the throughput required for high-volume production of functional nanostructures.

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