THE ROLL-TO-PLATE METHOD
Roll-to-Plate Nanoimprinting Is a High-Precision Method for Replicating Micro- and Nanoscale Features, where a UV-Curing Light Source Housed Within a Rotating Cylinder Imprints Structures onto a Rigid Substrate
Stensborg’s patented Roll-to-Plate Nanoimprint Lithography (R2P NIL) offers a scalable, high-throughput solution for replicating nano patterns onto rigid substrates.
Whether you’re engaged in early-stage R&D or scaling up to full production, our IP-backed Roll-to-Plate (R2P) systems deliver consistent, energy-efficient nanoimprinting across diverse industries, including AR/VR optics, flexible microelectronics, semiconductors, life sciences, and advanced photonics.
Designed to achieve feature sizes as small as 20 nm, with tunable throughput speeds starting from 0.005 metres per minute, this technique is suitable for use with transparent and non-transparent materials such as glass, silicon wafers, metal foils, quartz, and polymer substrates. R2P NIL is ideal for research centres, academic institutions, and companies seeking to scale their nanoimprint capabilities while maintaining exceptional structural fidelity.
At the core of each Roll-to-Plate setup is a transparent imprint cylinder embedded with Stensborg’s Optical Engine. This cylinder holds the NIL template, which, once in contact with the UV-curable resin on the substrate plate, activates the curing process precisely along the contact line. The result is a continuous, three-step process (Contact, Cure, and Release) executed with fine-tuned accuracy.
IP-Backed Technology: Rolling Nanoimprint Lithography
Developed from over two decades of nanoreplication expertise, Stensborg’s patented Optical engine is integrated directly inside the imprint roller. This design delivers focused UV light precisely in the nip, curing resin in real time while applying pressure. The system is fully customisable and can be adapted to Roll-to-Plate or Roll-to-Roll setups, enabling consistent replication of micro- and nanoscale structures across different production speeds.
Its modular architecture supports both laboratory-scale prototyping and industrial-scale manufacturing, making it ideal for research institutions and high-volume production lines alike.
Unlike traditional flat-to-flat nanoimprinting or injection moulding, our Rolling Nanoimprint Lithography requires significantly less imprinting force thanks to the narrow contact line and high-speed UV-curing source. This reduces air bubble entrapment, lowers material waste, and ensures high-resolution, repeatable pattern transfer across varying substrate thicknesses.
Versatile Substrate Compatibility
Suitable for glass, metal, silicon wafers, and other rigid transparent or opaque materials.
High Resolution Patterning
Achieves feature sizes down to 20 nm with high pattern fidelity.
Scalable Throughput Production
Supports speeds from 0.005 metres per minute, customisable to specific production needs.
Integrated UV-Curing Technology
Utilises a transparent cylinder housing our proprietary Optical Engine for high-precision, in-line curing.
Desktop Roll NanoImprinter 3.0: Process Validation for Nanoimprint Manufacturing
Desktop Roll NanoImprinter 3.0: Process Validation for UV-NIL Manufacturing
Desktop Roll NanoImprinter 3.0: Process Validation for UV-NIL Manufacturing
The Desktop Roll NanoImprinter 3.0 brings Stensborg’s patented Rolling Nanoimprint Lithography (RNIL) technology into a compact, digitally controlled Roll-to-Plate platform designed for process validation, material characterisation, and manufacturing development.
Built on the same HoloPrint® optical architecture as our industrial systems, the Desktop 3.0 enables engineering teams to establish repeatable process parameters, benchmark replication quality, and evaluate process compatibility under production-relevant conditions. Integrated software, sensor-driven monitoring, and full process traceability help reduce variability and accelerate the transition from development to manufacturing.
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